Ion / Production method | 181Ta24+ / Sputtering |
Compound used | Ta (natural 100%) |
Aspect Chemical sensitivity | Solid , stable
|
Ion source parameters | ECR4M-14GHz RF power 370 W Mixing gaz O2 / Sputtering gaz Ar Sputtering voltage : -1200V/1.4mA Source voltage : 19kV/2.4mA Intensity : 5.5 µA (181Ta24+) Consumption : 3 mg/h Total ionization efficiency : 1% |
Introduction to come here
Presented at the ECRIS Workshop : article
